Contact - JY Technology Inc.

SK Ventium 104-801, 166, Gosan-ro, Gunpo-city
Gyeonggi-do 15850

South Korea

Fax +82 427 2293

Latest products added

Arc cathode

Arc cathode

Sputter cathode

Sputter cathode

Linear Ion source

Linear Ion source

Legal information - JY Technology Inc.

Nature Headquarters
Year established 2007
Co.Registration No Information available as an option
No employees (address) 0-9 Employees
No employees 0-9 Employees
Kompass ID? KR105699

Presentation - JY Technology Inc.

Arc power supply, Linear Ion source, sputter cathode, sputter magnetron, circular arc cathode, rectangular arc cathode
, Plasma source, arc cathode, sputtering target, arc coating, power supply, ion source, sputter cathode, vacuum coating system, cold plasma

#Company Introduction:
We, JY Technology, provide plasma source (arc cathode. Sputter cathode and linear ion source ) that are required
for vacuum coating system.
The plasma technology is in wide usein the high tech industry ; semicon, FPD, Solar , AMOLED, Mobile, Automotive, etc.
The plasma source are essential and core factors togenerate the plasma and its quality.
JY Technology is trying to help customers develop the most productive and cost-effective thin film applications
on the market by providing the advanced plasma source.
By sharing the experience and accumulated Technologies through the internal thin film coating R&D center,
JY Tech is committing to do best that JY Technology will do best constantly in order for customers to be
advanced and competitive in the industry.

#Main product:
1. Arc power supply
- Arc coating for D.Cpower supply
*Technical Detail:
1) Enable Trigger running time : - Stable arc discharge
2) EMI noise filter to input/output and communication port: - Prevent malfunction by external noise
3) Various communication protocol : - ensure user convenience
4) High current power supply: - Applicable to various process
5) AutoTrigger function : - possible auto arc discharge
6) High accuracy output power:
- ensure 1% of setpoint full rated output accuracy

2. Linear Ion source
- Cleaning and Etching for Ion source
*Technical Detail:
1) Optimize Plasma discharge
2) Maximization of ionization rate
3) Minimization arc from Source
4) Minimization particle from Source

3. Sputter cathode
- Sputter for cathode
*Technical Detail:
1)Profiled Magnet Technology
2)Optimized Performance
3)Broad Rangeof Sizes
4)More Efficient Cooling
5)Standard and Custom Design Options
6)Standard and Custom Accessories
7)Robust Design Configurations

4. arc cathode
- Arc Coating forcathode
*Technical Detail:
1)Trigger : Igniter Swing Type.
- Prevent Trigger contamination
2) High cooling performance
- Accept high power and various process
3) Long Maintenance period & Easy assemble shield
- Long life time and easy Maintenance
4) Good magnet design with Simulation
- Stable coating process
5) Stable Magnet Field .
- Stable coating process

# Catalog:

# Video:

Location -  JY Technology Inc.

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